Multiple patterning

Results: 57



#Item
31White Paper  Accelerating 20nm Double Patterning Verification with IC Validator  Author

White Paper Accelerating 20nm Double Patterning Verification with IC Validator Author

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Source URL: www.synopsys.com

Language: English - Date: 2014-11-07 14:30:50
32White Paper  Design Solutions for 20nm and Beyond June 2012

White Paper Design Solutions for 20nm and Beyond June 2012

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Source URL: www.synopsys.com

Language: English - Date: 2014-11-07 12:41:40
33Microsoft PowerPoint - NNINsymposium.feb12 [Compatibility Mode]

Microsoft PowerPoint - NNINsymposium.feb12 [Compatibility Mode]

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Source URL: www.nanotech.ucsb.edu

Language: English - Date: 2013-01-06 22:14:17
34White Paper  Accelerating 20nm Double Patterning Verification with IC Validator  Author

White Paper Accelerating 20nm Double Patterning Verification with IC Validator Author

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Source URL: www.synopsys.com

Language: English - Date: 2014-11-07 12:41:33
35Datasheet  Sentaurus Lithography Predictive Modeling of Lithographic Processes  Overview

Datasheet Sentaurus Lithography Predictive Modeling of Lithographic Processes Overview

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Source URL: www.synopsys.com

Language: English - Date: 2014-11-07 14:34:17
36Lithius AutoCal Demo Report

Lithius AutoCal Demo Report

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Source URL: www.eecs.berkeley.edu

Language: English - Date: 2009-02-18 17:13:16
37We Create Solutions[removed]NW Monroe Ave • Suite 203 • Corvallis, OR 97330 • [removed] Samsung, Intel Capital and Applied Materials Fund Inpria to Develop Advanced Semiconductor Materials

We Create Solutions[removed]NW Monroe Ave • Suite 203 • Corvallis, OR 97330 • [removed] Samsung, Intel Capital and Applied Materials Fund Inpria to Develop Advanced Semiconductor Materials

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Source URL: www.inpria.com

Language: English - Date: 2014-02-18 00:25:01
38PROJECT RESULT  Lithography T404: Extreme UV lithography masks (EXTUMASK)

PROJECT RESULT Lithography T404: Extreme UV lithography masks (EXTUMASK)

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Source URL: www.catrene.org

Language: English - Date: 2009-03-25 10:39:55
39PROJECT RESULT  Lithography T406: Extreme UV consortium for imaging technology (ExCITe)

PROJECT RESULT Lithography T406: Extreme UV consortium for imaging technology (ExCITe)

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Source URL: www.catrene.org

Language: English - Date: 2009-03-25 10:39:59
40Project result  CT301 I Extreme UV lithography entry point technology development [EXEPT] The extreme ultra-violet (EUV)

Project result CT301 I Extreme UV lithography entry point technology development [EXEPT] The extreme ultra-violet (EUV)

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Source URL: www.catrene.org

Language: English - Date: 2013-09-04 08:46:13